Smee lithography

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Shanghai Micro Electronics Equipment SMEE , China's most successful lithography scanner manufacturer, reiterated plans this week to deliver its first scanner capable of producing chips on a 28nm-class fabrication process by the end of the year, reports TechWire Asia, citing newspaper Securities Daily , which in turn cites an unnamed source. A 28nm-capable lithography tool will over time enable Chinese chipmakers to rely on domestic lithography equipment for a range of mature technologies. The move is part of China's broader goal to achieve semiconductor self-sufficiency and reduce its dependence on foreign technology. But the question remains as to whether SMEE can produce this scanner in mass quantities, and when it can make such scanners available to substitute for machines from ASML, Canon, and Nikon. The latest export regulations from the U. As a result, China needs advanced domestic lithography tools to ensure that its chipmakers can produce chips on even fairly advanced process technologies, such as 14nm.

Smee lithography

In the realm of lithography technology, China has been making significant strides towards self-sufficiency in chip production. With the development of ultraviolet UV based lithographic technology at Shanghai Micro Electronic Equipment SMEE , China aimed to produce its own 28nm chips by the end of and 20nm chips by early , without relying on US fabrication technology and equipment. China's progress was hindered when the US, Japan, and the Netherlands initiated restrictions on the sales of advanced wafer fab equipment to Chinese companies. These restrictions, targeting chipmaking gear, which is a weak link in China's semiconductor supply chain, can be seen as a strategic alignment with the US-led "Chip-4 Alliance," aiming to curb China's semiconductor industry. Nevertheless, these restrictions have had an unintended consequence. SMEE, the Chinese leader in lithography gear that was blacklisted by the US, has announced its plans to deliver its first lithography machine based on 28nm technology later this year. It remains unclear whether SMEE can deliver these machines in bulk, as they still rely to some extent on foreign equipment. Even with Japan's recent export control measures for chipmaking equipment, including lithography machines, it is evident that China is likely one of the intended targets. The Dutch government has also announced restrictions on the export of specific advanced semiconductor equipment, affecting SMEE's potential competition with the world-leading lithography machine maker ASML. Chip production is not a task that any one country can accomplish independently. Global cooperation and collaboration are necessary. As Zhang Hong, a semiconductor industry analyst, pointed out, China should seek cooperation with proponents of globalization. The most advanced lithography machines, such as EUV machines, have hundreds of thousands of components, making reliance on the global supply chain essential. US Commerce Secretary Gina Raimondo has expressed concerns about China's significant investments in legacy chip production capacity. She emphasizes the importance of collaborating with allies to address this challenge and prevent future issues resulting from an excess capacity of mature and legacy chips.

China's 28nm Lithography Machine is Expected smee lithography Nevertheless, these restrictions have had an unintended consequence. Directory News Jobs Marketplace.

Shanghai Micro Electronics Equipment Group SMEE , a Chinese developer of lithography tools, announced its first machine capable of processing wafers using a 28nm-class process technology, reports Bloomberg. This advancement represents a major leap in China's quest to close the technological gap in the global chip industry. The announcement did not come without oddities. But after that, the company changed its post and removed any mentions of the 28nm-capable tool, focusing on the fact that SMEE was committed to building advanced lithography machines. This is a bit surprising as SMEE said in October that it would introduce a 28nm-capable lithography tool by the end of the year.

The economic cold war rages on. In October, the US imposed restrictions on AI chips and semiconductor manufacturing equipment , but it did not fully address all concerns. The US is the leader in wafer fabrication equipment with a majority share in deposition, etch, process control, CMP, and ion implantation, but many US equipment makers, such as Applied Materials, Lam Research, and KLA, have complained that US restrictions would allow overseas competitors such as the Dutch ASM International and Japanese Tokyo Electron to gain market share and blunt the impact of the technology restrictions. Furthermore, mask-related and OPC software required to operate lithography tools is also engineered in the US. On Friday, news broke that the three countries agreed to certain restrictions on lithography equipment. The question remains, how far do these restrictions go, and what do they contain? Our understanding is that these restrictions are extremely limited and only regard ArFi tools.

Smee lithography

Shanghai Micro Electronics Equipment Group SMEE , a state-backed firm, is on track to reveal its first scanner capable of producing chips on a 28nm process technology by the end of , state-controlled the Global Times reports. The machine could help China reduce its dependency on foreign wafer fab equipment, Bloomberg noted. The litho scanner is expected to use locally developed and produced components, which is why the stock price of China-based optical components manufacturers Mloptic, Kingsemi, and Castech were up on Wednesday. Meanwhile, there is still uncertainty about whether the Shanghai-based firm can produce these machines at scale.

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It remains unclear whether SMEE can deliver these machines in bulk, as they still rely to some extent on foreign equipment. The latest export regulations from the U. Global cooperation and collaboration are necessary. Note: If you choose to use the log-out feature, you will lose your saved information. Some reports claim they are able to use these machines to produce chips as small as 7nm. Full access to Tomorrow's Headlines. Is this 28nm-class scanner capable of producing smaller components or is it strictly capable of producing at 28nm? ThomasKinsley said:. Meanwhile, the U. Most Popular.

At more advanced nodes below 28 nanometers, leading Chinese firms continue to have access to some advanced Western tools, particularly deep ultraviolet DUV immersion lithography systems, that they will continue to use for as long as possible to stretch logic production at more advanced nodes, particularly down to 7 and even 5 nanometers. Nevertheless, it is important to note that using DUV tools for advanced node production is complex, because using techniques like multi-patterning also requires advanced capabilities in other key tools such as deposition and etch.

US Edition. Nikon and Canon to compete in lithography market share with cost-effective tools. Join the experts who read Tom's Hardware for the inside track on enthusiast PC tech news — and have for over 25 years. Please login to read more New users, please register first. Some reports claim they are able to use these machines to produce chips as small as 7nm. Asia Supply Chain dataset access. US Edition. This advancement represents a major leap in China's quest to close the technological gap in the global chip industry. Wednesday 6 March See all comments Over the past couple of decades, he has covered everything from CPUs and GPUs to supercomputers and from modern process technologies and latest fab tools to high-tech industry trends.